AP&S Spin|Step SpinMask 300 tool for mask cleaning, etching and resist strip.
Technical description
- Substrate size up to 200mm
- Photomask size from 2,5”x2,5” to 9”x9”
- Removal of organic contamination from the substrate surface (SPM dispense system)
- Fast and effective removal of particles (micrometer size and above)
- Removal of submicron particles from the substrate Surface (Megasonic System)
Application
- Photomask cleaning
- Photomask etching
- Photomask resist stripping
- Wafer cleaning
